Notice catalographique « Laboratory micro-x-ray fluorescence spectroscopy : instrumentation and applications »
- Titre
- Laboratory micro-x-ray fluorescence spectroscopy : instrumentation and applications
- Auteur ou éditeur
- Haschke, Michael, 1948-
- Lieu de publication
- Cham
- Maison d'édition
- Springer
- Date de publication
- 2014
- Collation
- XVIII, 356 pages : illustrations
- Série
- Springer series in surface sciences
- Résumé
- Micro-X-ray fluorescence offers the possibility for a position- sensitive and non-destructive analysis that can be used for the analysis of non-homogeneous materials and layer systems. This analytical technique has shown a dynamic development in the last 15 years and is used for the analysis of small particles, inclusions, of elemental distributions for a wide range of different applications both in research and quality control. The first experiments were performed on synchrotrons but there is a requirement for laboratory instruments which offers a fast and immediate access for analytical results. The book discuss the main components of a µ-XRF instrument and the different measurement modes, it gives an overview about the various instruments types, considers the special requirements for quantification of non-homogeneous materials and presents a wide range of application for single point and multi-point analysis as well as for distribution analysis in one, two and three dimensions.
- Table des matières
- 1. XRF-Basics -- 1.1. Introduction -- 1.2. Interaction of X-rays with Matter Used for Material Characterization -- 1.2.1. Absorption -- 1.2.2. Emission of Fluorescence Radiation -- 1.2.3. Refraction -- 1.2.4. Scattering -- 1.2.5. Diffraction -- 1.3. General Design of X-ray Spectrometers -- References -- 2. Main Components of X-ray Spectrometers -- 2.1. Excitation Source -- 2.1.1. Excitation by Electrons -- 2.1.2. Excitation by Photons -- 2.1.3. X-ray Tubes -- 2.1.4. Conclusions for Excitation in µ-XRF -- 2.2. Primary Optics -- 2.2.1. Basic Properties of X-ray Optics -- 2.2.2. Diffraction Optics -- 2.2.3. Refraction Optics -- 2.2.4. Reflection Zone Plates -- 2.2.5. Optics Based on Total Reflection -- 2.2.6. Comparison of Different Optics for Their Use in µ-XRF -- 2.3. Sample Positioning and Radiation Shielding -- 2.3.1. Special Requirements for Sample Positioning in µ-XRF -- 2.3.2. Image View -- 2.3.3. Spatial Resolution -- 2.3.4. Measurement Media -- 2.4. Secondary Optics: Spectrometer Type -- 2.4.1. Wavelength Dispersive Spectrometers -- 2.4.2. Energy Dispersive Spectrometers -- 2.5. X-ray Detectors -- 2.5.1. Working Principles and Detector Types -- 2.5.2. Generation of an Energy Dispersive Spectrum -- 2.5.3. Energy Resolution -- 2.5.4. Detection Efficiency -- 2.5.5. Development of Energy Dispersive X-ray Detectors -- 2.5.6. Detector Artifacts -- References -- 3. Special Requirements for µ-XRF -- 3.1. History of Position Sensitive Element Analysis -- 3.2. Possibilities for Spatial Resolved XRF -- 3.2.1. Excitation of a Small Sample Area -- 3.2.2. Excitation of a Large Sample Area -- 3.2.3. Confocal Geometry -- 3.3. Instrument Types -- 3.3.1. Spot Generation -- 3.3.2. Excitation Direction -- 3.3.3. Detector Types -- 3.3.4. Measurement Medium -- 3.3.5. Sample Movement -- 3.3.6. Type of the Spectrometer -- 3.3.7. Instruments on the Market -- 3.4. Typical Measurement Modes for µ-XRF -- 3.4.1. Single Point Measurement -- 3.4.2. Mutiple Point Measurement -- 3.4.3. Area Analysis -- 3.4.4. Linescan -- 3.4.5. Mapping -- References -- 4. Quantification -- 4.1. Introduction -- 4.2. Different Types of Quantification -- 4.2.1. Qualitative and Semi-quantitative Methods -- 4.2.2. Quantification Methods -- 4.3. Quantification for µ-XRF -- 4.3.1. Special Conditions -- 4.3.2. Quantification with the Fundamental Parameter Model -- 4.3.3. Summary -- 4.4. Analysis of Coating Systems -- 4.4.1. Principle of Coating Analysis -- 4.4.2. Requirements for Coating Analysis -- 4.4.3. General Equations for Coating Thickness Testing -- 4.4.4. Thickness Ranges for the Coating Measurements -- 4.4.5. Multiple Layer Analysis -- 4.4.6. Accuracy for Coating Analysis -- 4.4.7. Summary -- 4.5. Errors in µ-XRF -- 4.5.1. Characterization of Errors -- 4.5.2. Random Error Contributions -- 4.5.3. Systematic Error Contributions -- 4.5.4. Concept of Uncertainty -- 4.5.5. Possibilities for Improvement of Accuracy -- References -- 5. Sample Preparation -- 5.1. Introduction -- 5.2. Information Depth -- 5.3. Preparation and Presentation of Different Sample Qualities -- 5.3.1. Solid Samples -- 5.3.2. Powder Samples -- 5.3.3. Filter Materials -- 5.3.4. Liquid Samples -- 5.3.5. Archeological Samples -- References -- 6. Relations to Other Analytical Methods -- 6.1. Comparison with Other Micro-Analytical Methods -- 6.1.1. Overview -- 6.1.2. Synchrotron Excited µ-XRF -- 6.1.3. SEM-EDS -- 6.2. Combination of µ-XRF with Other Methods -- 6.2.1. General Remarks -- 6.2.2. SEM-EDS and µ-XRF -- 6.2.3. µ-XRF and µ-XRD -- 6.2.4. Raman Spectroscopy and µ-XRF -- References -- 7. Applications -- 7.1. Point Analysis -- 7.1.1. Analysis of Precious Metal Alloys -- 7.1.2. Coating Thickness Analysis -- 7.1.3. Analysis of Particles and Inclusions -- 7.1.4. Analysis of Restricted Elements in Consumer Goods -- 7.2. Multiple Point Analysis -- 7.2.1. Area Analysis -- 7.2.2. Muliti-point Measurements -- 7.2.3. High Throughput Screening -- 7.3. One Dimensional Distribution Analysis: LineScan -- 7.3.1. Determination of Diffusion Profiles -- 7.3.2. Analysis of Gems -- 7.3.3. Examination of Roll Bearings -- 7.3.4. Analysis of Sediment Bore Cores -- 7.4. Two Dimensional Distribution Analysis: Mapping -- 7.4.1. Analysis of Geological Samples -- 7.4.2. Examination of Art Objects -- 7.4.3. Life Science Applications -- 7.4.4. Electronics -- 7.4.5. Material Analysis -- 7.4.6. Forensic Applications -- 7.5. Three Dimensional Distribution Analysis -- 7.5.1. Destructive 3D-Analysis -- 7.5.2. Measurements with Confocal Geometry -- References -- 8. Prospectives for µ-XRF -- 8.1. lnstrumentaion -- 8.2. Instrument Control and Data Evaluation -- Reference.
- Notes
- XRF-Basics -- Main Components of X-Ray Spectrometers -- Special Requirements for µ-XRF -- Quantification -- Sample Preparation -- Relations to Other Analytical Methods -- Applications
- Includes bibliographical references and index.
- Langue
- English = Anglais
- Sujet
- X-ray microanalysis
- X-ray spectroscopy
- Measurement Science and Instrumentation
- Spectroscopy and Microscopy
- microanalyse aux rayons X
- Spectroscopie des rayons X
- Science de la mesure et instrumentation
- Spectroscopie et microscopie
- ISBN/ISSN
- 9783319048635
- Pays
- Switzerland
- Type de document
- Monograph = Monographie
- Localisation
- QD 96 .X2 .H27 2014
- Clé
- 19174
- Collection
- Catalogue